2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...
A new technical paper titled “Controlling Speckle Contrast Using Existing Lithographic Scanner Knobs to Explore the Impact on Line Width Roughness” was published by researchers at Samsung, ASML and ...
Paul Scherrer Institute (PSI) has developed an open-source software technology for scanning electron microscopy (SEM) applications. The technology is targeted for EUV resist metrology. The technology, ...
Companies to share key equipment to help drive EUV process development. TOKYO & VELDHOVEN, the Netherlands--(BUSINESS WIRE)-- Tokyo Electron Limited (TEL) and ASML Holding NV (ASML) today announced an ...
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